The Jandel CYL-RM3000 Four Point Probe System is used to measure the sheet resistance of shallow layers (as a result of epitaxy, ion-implant, diffusion or sputtering) and the bulk resistivity of bulk wafers. It is capable of sourcing 10 nA up to 100 mA, and 0 to 1000 mV. Our probe head has 4 tips with a spacing of 1 mm apart from each other. Each tip has a radius of 40 microns and it is preset to a pressure of 60 grams of force that will be exerted on your sample. The maximum pressure is 150 grams. The unit is capable of producing 10 nA up to 100 mA with a voltage of 0 to 1000 mV.
Electrical Engineering Cleanroom
Davis Hall, Suite 114
University at Buffalo North Campus
Buffalo, NY 14260
Donald J. Goralski
Director, Shared Instrumentation Laboratories
(716) 645-5151
For technical inquiries, contact:
Jeff Salzmann
Assistant Professor of Research, Cleanroom Manager
(716) 645-2584