Photolithography and sample preparation

Ultraviolet Ozone Cleaning System - UVOCS T10x10/OES

The UVOCS T10x10/OES Ultraviolet Ozone Cleaning System provides a simple, inexpensive and fast method of obtaining ultra-clean surfaces free of organic contaminants.  This process is ideal when thin film deposition with excellent adhesion to the surface is required.  Ultra-clean surfaces can easily be achieved by UV/Ozone processing in one to several minutes after the surface has been cleaned by conventional techniques.


Electrical Engineering Cleanroom
Davis Hall, Suite 114
University at Buffalo North Campus
Buffalo, NY 14260


  • Internal Academic: $25
  • External Academic: $25
  • Industry: $100
For general inquiries, contact:

Donald J. Goralski
Director, Shared Instrumentation Laboratories
(716) 645-5151

For technical inquiries, contact:

Jeff Salzmann
Assistant Professor of Research, Cleanroom Manager
(716) 645-2584