Field Emission Scanning Electron Microscope (FESEM) w/Electron Beam Lithography attachment - JEOL JSM-6500F

Microscopy & Metrology

The JEOL JSM-6500F is a Field Emission Scanning Electron Microscope (FESEM) w/Electron Beam Lithography attachment, and Nanometer Pattern Generation Systems (NPGS). It offers high resolution images of very small inorganic and organic surface structures. The NPGS attachment enables lithography applications for semiconductor processing. This system is routinely used to create structures with features down to 50 nm. Higher resolution is possible with sufficient process optimization.


• Resolution: 1.5 nm
• Acceleration Voltage: 0.5 ~ 30 kV
• Maximum probe current: 200 nA
• Magnification: x10 ~ 500,000
• Maximum specimen size: 150 mm diameter


Electrical Engineering Cleanroom
Davis Hall, Suite 114
University at Buffalo North Campus
Buffalo, NY 14260


Usage Fees:

SEM Imaging Only:        ACADEMIC RATES

                                                $25/hour unassisted or

                                                $35/hour with technical assistance

                                        INDUSTRY RATES

            $170/hour (no unassisted use permitted
             without full training)

e-Beam Lithography:      ACADEMIC RATES

$45/hour unassisted for the first 20 hours of the fiscal year

$36/hour unassisted for the next 30 hours per fiscal year

$30/hour unassisted beyond 50 hours per fiscal year

$100/hour with technical assistance (ad hoc e-beam users)

Fiscal year runs July 1 – June 30


$200 per hour (no unassisted use permitted w/o full training)

For initial inquiries, contact:

Donald Goralski

Director, Shared Instrumentation Laboratories

(716) 645-5151

For technical inquiries, contact:

Yueling Qin, PhD

Research Assistant Professor

Sr. Research Support Specialist

(716) 645-8698