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Instrument Facilities

photo of a lab

Lab of chemistry professor Luis A. Colon in the Natural Sciences Complex

INS maintains a set of centrally-coordinated instruments that supports research in nanoscience, as well as related physics, engineering, and materials research. All facilities are available to both UB faculty and external users, for modest cost-recovery fees.

Additional support for the facility comes from the UB Office of the Vice President for Research, the UB School of Engineering, and the UB College of Arts and Sciences. Individual instruments and instrument clusters are described below. For further information, contact Dr. Mark Swihart at swihart@buffalo.edu.

High Resolution Transmission Electron Microscopy Facility (HRTEM)

The High Resolution Transmission Electron Microscopy facility (HRTEM) of INSIF is a central, shared facility for microanalysis. The facility provides microanalysis services to both researchers on the UB campus, as well as off-campus industries and other institutions in the region. The HRTEM staff will provide assistance and training in electron microscopy techniques to enable research groups to pursue their research objectives.

The JEOL JEM 2010 is a high-resolution electron microscope with an accelerating voltage of 200KV, and a point resolution of 0.19 nm. It is equipped with a 5-axis micro-active goniometer, which makes micro-structural analysis possible for many kinds of crystalline materials. The TEM provides morphology images, in either bright or dark field and the correspondingcrystal structuresby electron diffraction; Additionally there are two different modes of operation: the Convergent Beam Diffraction (CBD) modeis very helpful in analyzing crystal symmetry, while theNano Beam Diffraction (NBD) modewill provide the crystal structure for nano-particles. A new Gatan CCD camera and associated Digital Micrograph software was installed in Summer 2008, providing improved lattice-resolution HRTEM capabilities and a variety of automated measurement capabilities, including real-time video recording.  Sample preparation tools (wire saw, dimpler, polishers, etc.) are also available.

Contact:

Dr. Yueling Qin
109 Fronczak Hall
UB North Campus
Phone: (716) 645-2017, ext. 116
E-mail: yqin@buffalo.edu

Focused Ion Beam/Scanning Electron Microscopy Facility

The FIB/SEM facility consists of a Zeiss Auriga XBeam focused ion beam/field-emission SEM system with TEM liftout, Oxford EDS system, Avizo imaging interface/software for 3D reconstruction of depth profiles, etc. Key capabilities of this system include:

  • Electron beam (E-beam) and focused ion beam (FIB) nano-lithography
  • Precise preparation of cross-sectional samples for transmission electron microscopy (TEM)
  • 3D tomography: 3D visualization with nanometer-scale resolution
  • High resolution Field-emission-SEM and FIB imaging
  • Energy-dispersive x-ray spectroscopy to analyze material composition (with nm resolution)
  • Gas injection for both etching and deposition of both conducting and insulating materials

Contact:

Dr. Yueling Qin
109 Fronczak Hall
UB North Campus
Phone: (716) 645-2017, ext. 116
E-mail: yqin@buffalo.edu

The Clean Room Facility

The Clean Room Facility of INSIF provides optical lithography and device processing, fabrication, and testing. It provides a range of fabrication and processing capabilities to UB researchers, as well as external users, in conjunction with our faculty.

Capabilities

 

A new UB cleanroom has recently opened in a brand-new engineering building (Jack & Barbara Davis Hall on UB North Campus). This 130,000-plus-square-foot facility is the new home of the Departments of Electrical Engineering and Computer Science and Engineering, and includes a 5,000-square-foot cleanroom with a combination of class-w00 and class-1000 space. The facility is maintained by a full-time, PhD-level manager and associated technician, who are helped in their day-to-day work by a number of graduate assistants.

Major items of equipment within the cleanroom includes furnaces, a thermal evaporator, an electron-beam evaporator, a Karl Suss MJB-3 mask aligner, an ellipsometer, a reactive ion etch for dry patterning, and photoresist system for photoresist deposition. A deionized water system provides the high-purity water required in semiconductor processing. Measurement facilities include optical microscopes, a sub-micron probe station, current-voltage-temperature, capacitance-voltage-temperature, deep level transient spectroscopy, quasi-static C-V, cryogenic systems, and a variety of meters for measuring resistance, current, capacitance and voltage.

Nanolithography capabilities are provided by facilities for electron-beam and focused-ion-beam lithography. Electron-beam lithography is performed using a JEOL JSM 6500F field-emission microscope configured with the Nabity NPGS system. This System is routinely used to create structures with features smaller than 20 nm. This capability has been enhanced by the recent, NSF/MRI-enabled, purchase of a Zeiss Auriga XBeam focused ion beam/scanning electron microscope.

Dr. W.A. Anderson
Phone: (716) 645-2422, ext. 1215
Fax: (716) 645-5964
E-mail: wanders@acsu.buffalo.edu

Electron Beam Lithography Facility

The Electron Beam Lithography Facility at the University at Buffalo is located in 118 Bonner Hall on the North Campus. Major equipment in the EBL facility includes:

  • JEOL JSM6500F Scanning Electron Microscope
  • Nabity NPGS E-Beam Writing System
  • CEE Model 100 Spin Coater
  • Bake Oven

Contact:

Dr. Yueling Qin
109 Fronczak Hall
UB North Campus
Phone: (716) 645-2017, ext. 116
E-mail: yqin@buffalo.edu

Device Bonding

A K&S Model 4522 Digital Ball Wire Bonder supports the various fabrication and characterization labs of INSIF. This is a ball-bonder type machine that can store various wire bonding “recipes.” It can bond with gold wires from 18-75 microns in diameter. The machine is located in 210 Bonner Hall on UB’s North Campus.

Contact:

Dr. Albert H. Titus
213 Bonner Hall
UB North Campus
Phone: (716) 645-3115, ext. 1200
E-mail: ahtitus@eng.buffalo.edu

Physical Property Measurement system

This facility consists of a Quantum Design Physical Property Measurement system (PPMS) that can make a variety of electrical and magnetic measurements on samples over a broad range of temperatures (down to liquid helium temperature) and in the presence of high applied magnetic field (up to 9 Tesla).

Contact:

Dr. Hao Zeng
239 Fronczak Hall
UB North Campus
Phone: (716) 645-1019
E-mail:haozeng@buffalo.edu

Fourier Transform Infrared Spectrocopy Facility

This facility consists of a Bruker FTIR spectrometer with a MCT detector and mirrors/accessories needed for coupling to an external bolometer as well as for carrying out experiments outside the main sample chamber.

Contact:

Dr. Andrea Markelz
130 Fronczak Hall
UB North Campus
Phone: (716) 645-2739
E-mail: amarkelz@buffalo.edu

Atomic Force Microscopy Facility

This facility consists of a Quesant Resolver AFM typically used for hard materials.  This Atomic Force Microscope is capable of scanning large samples (6 in x 6 in x 2 in) and resolving individual atoms. A 90° top-down view with a monocular microscope provides for easy laser alignment and the ability to quickly find sample features as small as 4 µm.

Contact:

Dr. Yueling Qin
109 Fronczak Hall
UB North Campus
Phone: (716) 645-2017, ext. 116
E-mail: yqin@buffalo.edu