Instrument Facilities
Lab of chemistry professor Luis A. Colon in the Natural Sciences Complex
INS maintains a set of centrally-coordinated instruments that
supports research in nanoscience, as well as related physics,
engineering, and materials research. All facilities are available
to both UB faculty and external users, for modest cost-recovery
fees.
Additional support for the facility comes from the UB Office of
the Vice President for Research, the UB School of Engineering, and
the UB College of Arts and Sciences. Individual instruments and
instrument clusters are described below. For further information,
contact Dr. Mark Swihart at swihart@buffalo.edu.
High Resolution Transmission Electron Microscopy Facility (HRTEM)
The High Resolution Transmission Electron Microscopy facility
(HRTEM) of INSIF is a central, shared facility for
microanalysis. The facility provides microanalysis services to both
researchers on the UB campus, as well as off-campus industries and
other institutions in the region. The HRTEM staff will provide
assistance and training in electron microscopy techniques to enable
research groups to pursue their research objectives.
The JEOL JEM 2010 is a high-resolution electron microscope with
an accelerating voltage of 200KV, and a point resolution of 0.19
nm. It is equipped with a 5-axis micro-active goniometer, which
makes micro-structural analysis possible for many kinds of
crystalline materials. The TEM provides morphology images, in
either bright or dark field and the correspondingcrystal
structuresby electron diffraction; Additionally there are two
different modes of operation: the Convergent Beam Diffraction (CBD)
modeis very helpful in analyzing crystal symmetry, while theNano
Beam Diffraction (NBD) modewill provide the crystal structure for
nano-particles. A new Gatan CCD camera and associated Digital
Micrograph software was installed in Summer 2008, providing
improved lattice-resolution HRTEM capabilities and a variety of
automated measurement capabilities, including real-time video
recording. Sample preparation tools (wire saw, dimpler,
polishers, etc.) are also available.
Contact:
Dr. Yueling Qin
109 Fronczak Hall
UB North Campus
Phone: (716) 645-2017, ext. 116
E-mail: yqin@buffalo.edu
Focused Ion Beam/Scanning Electron Microscopy Facility
The FIB/SEM facility consists of a Zeiss Auriga XBeam focused
ion beam/field-emission SEM system with TEM liftout, Oxford EDS
system, Avizo imaging interface/software for 3D reconstruction of
depth profiles, etc. Key capabilities of this system include:
- Electron beam (E-beam) and focused ion beam (FIB)
nano-lithography
- Precise preparation of cross-sectional samples for transmission
electron microscopy (TEM)
- 3D tomography: 3D visualization with nanometer-scale
resolution
- High resolution Field-emission-SEM and FIB imaging
- Energy-dispersive x-ray spectroscopy to analyze material
composition (with nm resolution)
- Gas injection for both etching and deposition of both
conducting and insulating materials
Contact:
Dr. Yueling Qin
109 Fronczak Hall
UB North Campus
Phone: (716) 645-2017, ext. 116
E-mail: yqin@buffalo.edu
The Clean Room Facility
The Clean Room Facility of INSIF provides optical lithography
and device processing, fabrication, and testing. It provides a
range of fabrication and processing capabilities to UB researchers,
as well as external users, in conjunction with our faculty.
Capabilities
A new UB cleanroom has recently opened in a brand-new
engineering building (Jack & Barbara Davis Hall on UB North
Campus). This 130,000-plus-square-foot facility is the new home of
the Departments of Electrical Engineering and Computer Science and
Engineering, and includes a 5,000-square-foot cleanroom with a
combination of class-w00 and class-1000 space. The facility is
maintained by a full-time, PhD-level manager and associated
technician, who are helped in their day-to-day work by a number of
graduate assistants.
Major items of equipment within the cleanroom includes furnaces,
a thermal evaporator, an electron-beam evaporator, a Karl Suss
MJB-3 mask aligner, an ellipsometer, a reactive ion etch for dry
patterning, and photoresist system for photoresist deposition. A
deionized water system provides the high-purity water required in
semiconductor processing. Measurement facilities include optical
microscopes, a sub-micron probe station,
current-voltage-temperature, capacitance-voltage-temperature, deep
level transient spectroscopy, quasi-static C-V, cryogenic systems,
and a variety of meters for measuring resistance, current,
capacitance and voltage.
Nanolithography capabilities are provided by facilities for
electron-beam and focused-ion-beam lithography. Electron-beam
lithography is performed using a JEOL JSM 6500F field-emission
microscope configured with the Nabity NPGS system. This System is
routinely used to create structures with features smaller than 20
nm. This capability has been enhanced by the recent,
NSF/MRI-enabled, purchase of a Zeiss Auriga XBeam focused ion
beam/scanning electron microscope.
Dr. W.A. Anderson
Phone: (716) 645-2422, ext. 1215
Fax: (716) 645-5964
E-mail: wanders@acsu.buffalo.edu
Electron Beam Lithography Facility
The Electron Beam Lithography Facility at the University at
Buffalo is located in 118 Bonner Hall on the North Campus. Major
equipment in the EBL facility includes:
- JEOL JSM6500F Scanning Electron Microscope
- Nabity NPGS E-Beam Writing System
- CEE Model 100 Spin Coater
- Bake Oven
Contact:
Dr. Yueling Qin
109 Fronczak Hall
UB North Campus
Phone: (716) 645-2017, ext. 116
E-mail: yqin@buffalo.edu
Device Bonding
A K&S Model 4522 Digital Ball Wire Bonder supports the
various fabrication and characterization labs of INSIF. This is a
ball-bonder type machine that can store various wire bonding
“recipes.” It can bond with gold wires from 18-75
microns in diameter. The machine is located in 210 Bonner Hall on
UB’s North Campus.
Contact:
Dr. Albert H. Titus
213 Bonner Hall
UB North Campus
Phone: (716) 645-3115, ext. 1200
E-mail: ahtitus@eng.buffalo.edu
Physical Property Measurement system
This facility consists of a Quantum Design Physical Property
Measurement system (PPMS) that can make a variety of electrical and
magnetic measurements on samples over a broad range of temperatures
(down to liquid helium temperature) and in the presence of high
applied magnetic field (up to 9 Tesla).
Contact:
Dr. Hao Zeng
239 Fronczak Hall
UB North Campus
Phone: (716) 645-1019
E-mail:haozeng@buffalo.edu
Fourier Transform Infrared Spectrocopy Facility
This facility consists of a Bruker FTIR spectrometer with a MCT
detector and mirrors/accessories needed for coupling to an external
bolometer as well as for carrying out experiments outside the main
sample chamber.
Contact:
Dr. Andrea Markelz
130 Fronczak Hall
UB North Campus
Phone: (716) 645-2739
E-mail: amarkelz@buffalo.edu
Atomic Force Microscopy Facility
This facility consists of a Quesant Resolver AFM typically used
for hard materials. This Atomic Force Microscope is capable
of scanning large samples (6 in x 6 in x 2 in) and resolving
individual atoms. A 90° top-down view with a monocular
microscope provides for easy laser alignment and the ability to
quickly find sample features as small as 4 µm.
Contact:
Dr. Yueling Qin
109 Fronczak Hall
UB North Campus
Phone: (716) 645-2017, ext. 116
E-mail: yqin@buffalo.edu
