The Kurt J. Lesker Company® PRO Line PVD 75 is the next generation thin film deposition system based on the workhorse PVD 75 platform.
With more than 400 units in service worldwide, the PVD 75 is a proven, robust, and versatile design. The PRO Line PVD 75 builds on the successes of the original design with improved system base pressures and pump down times. A technically superior chamber design, an industry best software control system with advanced programming capability, automatic substrate loading, and numerous features for optimized thin film performance are a few of the key advantages offered in this innovative, best of class design.
Donald J. Goralski
Director, Shared Instrumentation Laboratories
For technical inquiries, contact:
David Eason, PhD
Assistant Professor of Research
Department of Electrical Engineering and Materials Design and Innovation
Technical Director, Shared Instrumentation Laboratories (SIL)
114A Davis Hall