The Karl Süss MJB3 Mask Aligner is designed for high resolution photolithography and can handle standard wafers, irregular substrates and variety of thicknesses.
• Top Side Alignment
• 350 Watt Hg lamp
• i-line, Süss Normalfield Microscope with 5X, 10X, and 20X eyepieces
• Vacuum, Hard and soft Contact modes
• 3" wafer size
• Mask size 4" x 4"
• Resolution to ~1 micrometer
Donald J. Goralski
Director, Shared Instrumentation Laboratories
For technical inquiries, contact:
David Eason, PhD
Assistant Professor of Research
Department of Electrical Engineering and Materials Design and Innovation
Technical Director, Shared Instrumentation Laboratories (SIL)
114A Davis Hall