Photolithography

Mask Aligner (contact) - Süss MicroTec / Karl Süss MJB3 (2 available)

The Karl Süss MJB3 Mask Aligner is designed for high resolution photolithography and can handle standard wafers, irregular substrates and variety of thicknesses.

Features

• Top Side Alignment
• 350 Watt Hg lamp
• i-line, Süss Normal Field Microscope with 5X, 10X, and 20X eyepieces
• Vacuum, Hard and soft Contact modes
• 3" wafer size
• Mask size 4" x 4"
• Resolution to ~1 micrometer

Location

Electrical Engineering Cleanroom
Davis Hall, Suite 114
University at Buffalo North Campus
Buffalo, NY 14260

Fees

  • Internal Academic: $25
  • External Academic: $25
  • Industry: $100
Learn more about our rates
Zoom image: Mask Aligner (contact) - Süss MicroTec / Karl Süss MJB3emplate Mask Aligner (contact) - Süss MicroTec / Karl Süss MJB3emplate

Mask Aligner (contact) - Süss MicroTec / Karl Süss MJB3emplate

For general inquiries, contact:

Donald J. Goralski
Director, Shared Instrumentation Laboratories
(716) 645-5151