Chemicals provided by the Shared Instrumentation Laboratories

Davis Hall Electrical Engineering Cleanroom

  • 50 PMMA A-9 (positive polymer)
  • 950 PMMA A-5 (positive polymer)
  • 950 PMMA A-4 (positive polymer)
  • 950 PMMA A-2 (positive polymer)
  • 495 PMMA A-4 (positive polymer)
  • Copolymer EL9 in anisole (EL9 MMA 8.5)
  • A2 300 MF Developer
  • Amonium hydroxide (NHOH)
  • Hexamethyldrsilazane, 98% ( N flushed)
  • LOR -1A (Lift off Resist positive polymer)
  • LOR -3B (Lift off Resist)
  • LOR -10B (Lift off Resist)
  • MF-26A (TMAH based developer)
  • MIBK/IPA 1:3 Developer
  • P-20 primer
  • Remover PG
  • S1805 (Microposit, positive photores.)
  • S1813 (Microposit, positive photores.)
  • S1818 (Microposit, positive photores.)
  • KL 1607 (positive photores.)
  • MF-319 (TMAH based developer for S1818)
  • 1165 (Stripper for S1818 and PMMA)
  • Kemlabs, HARE SQ-5 (negative resist)
  • Kemlabs, HARE SQ-10 (negative resist)
  • Kemlabs, HARE SQ-50 (negative resist)
  • Kemlabs, HARE SQ Developer
  • SU-8 2010 (negative resist)
  • SU-8 2015 (negative resist)
  • SU-8 2050 (negative resist)
  • SU-8 2100 (negative resist)
  • SU-8 Developer
  • PMGI SF-10
  • OmniCoat
  • Tetrahydrofuran, T425-1
  • Chloroform
  • Tetraethoxysilane, 99.9% (TEOS)
  • HO (Hydrogen Peroxide)
  • Acetone, electronic grade
  • Methanol, electronic grade
  • Ethanol (ethyl alcohol)
  • Isopropyl alcohol, 99.5%, electronic grade
  • Trichloroethylene, electronic grade 99.5+%
  • Oxygen gas
  • Argon gas
  • Nitrogen gas
  • Helium gas
  • CDA (Clean dry air)
  • RODI water
  • BCl Gas (Boron Trichloride)
  • Cl Gas (Chlorine)
  • CF gas (Tetrafluromethane)
  • Forming gas 5%H/95%Ar

Furnas Hall Materials Charaterization Laboratory

  • Acetone
  • Methanol
  • Isopropyl alcohol, 70%
  • Chloroform 
  • Argon gas
  • Nitrogen gas
  • Helium gas
  • CDA (Clean dry air)
  • RODI water