Deposition

E-Beam Evaporator with thermal evaporation sources - BOC Edwards Auto 500

The BOC Edwards Auto 500 electron-beam evaporation system can deposit ultra pure thin films of materials with high melting points and achieve fast deposition rates. It also features two thermal evaporation sources along with the e-beam source inside the chamber.

Features

• Four pocket electron-beam source

• Two independent thermal evaporation sources

• 5 kV high voltage supply

• X-Y beam sweep, substrate heating, substrate rotation

• FTM-7 quartz thickness monitor

• Source materials: SiO₂, Al, Ge, Ag and Au, etc.

• Large box chamber: 500 mm diameter x 500 mm high

• Front loading enables easy access into the chamber

• Automatic PLC operated vacuum control system with touch screen display enables easy operation and in-situ thickness monitoring

• Ultimate vacuum: 5 x 10⁻⁷ Torr

• Pumpdown: < 13 min to 7.5 x 10⁻⁶ Torr and < 60 min to 1.5 x 10⁻⁶ Torr

Location

Electrical Engineering Cleanroom
Davis Hall, Suite 114
University at Buffalo North Campus
Buffalo, NY 14260

Fees

Usage Fee: $25/hour (academic), $100/hour (industry)

E-Beam Evaporator with thermal evaporation sources - BOC Edwards Auto 500

For general inquiries, contact:

Donald J. Goralski

Director, Shared Instrumentation Laboratories

(716) 645-5151

 

For technical inquiries, contact:

David Eason, PhD

Technical Director, Shared Instrumentation Laboratories

(716) 645-8496