The Harrick Plasma PDC-001 Plasma Cleaner serves as an excellent tool for nanoscale surface cleaning, surface preparation and surface modification/treatment.
• Three adjustable RF power settings: 7.16 W (low), 10.15 W (medium) and 29.6 W (high)
• RF frequency: MHz range
• Process gas: room air
• 6” diameter x 6.5” length Pyrex glass chamber
Electrical Engineering Cleanroom
Davis Hall, Suite 114
University at Buffalo North Campus
Buffalo, NY 14260
Donald J. Goralski
Director, Shared Instrumentation Laboratories
(716) 645-5151
For technical inquiries, contact:
David Eason, PhD
Assistant Professor of Research
Department of Electrical Engineering and Materials Design and Innovation
Technical Director, Shared Instrumentation Laboratories (SIL)
114A Davis Hall
716-645-8496