Photolithography

Spin Coaters: SCS; Laurell (ø150mm)

Two Specialty Coating Systems (SCS) G3P-8 Spin Coaters

Easy-to-use spin coaters for precise and uniform deposition of thin films and coatings. They can be used to deposit metal oxide thin films, polymer coatings and metal organic thin films.

Features

  • 30 programmable recipes, with up to 20 steps each
  • each step can be 0-10,000 rpm

The Laurell Technologies Corporation WS-650MS-23NPP/LITE ø150mm Spin Coater

Features

  • Enables SU photoresist coating of substrate wafers

Location

Electrical Engineering Cleanroom
Davis Hall, Suite 114
University at Buffalo North Campus
Buffalo, NY 14260

Fees

Usage Fee: $25/hour (academic), $100/hour (industry)

Spin Coaters – Several spin coaters are available for photoresist application.

Spin Coaters – Several spin coaters are available for photoresist application

For general inquiries, contact:

Donald J. Goralski
Director, Shared Instrumentation Laboratories
(716) 645-5151

For technical inquiries, contact:
David Eason, PhD
Assistant Professor of Research
Department of Electrical Engineering and Materials Design and Innovation
Technical Director, Shared Instrumentation Laboratories (SIL)
114A Davis Hall
716-645-8496