University at Buffalo - The State University of New York
Skip to Content
Equipment and Instrumentation Portal (EQUIP)

Etching

Plasma Cleaner (O2) - Harrick-Plasma PDC-001

The Harrick Plasma PDC-001 Plasma Cleaner serves as an excellent tool for nanoscale surface cleaning, surface preparation and surface modification/treatment.

Features

• Three adjustable RF power settings: 7.16 W (low), 10.15 W (medium) and 29.6 W (high)

• RF frequency: MHz range

• Process gas: room air

• 6” diameter x 6.5” length Pyrex glass chamber

Location

Electrical Engineering Cleanroom
Davis Hall, Suite 114
University at Buffalo North Campus
Buffalo, NY 14260

Fees

Usage Fee: $25/hour (academic), $100/hour (industry)

Harrick Plasma PDC-001 Plasma Cleaner

Harrick Plasma PDC-001 Plasma Cleaner

For general inquiries, contact:

Donald J. Goralski

Director, Shared Instrumentation Laboratories

(716) 645-5151

 

For technical inquiries, contact:

David Eason, PhD

Technical Director, Shared Instrumentation Laboratories

(716) 645-8496