University at Buffalo - The State University of New York
Skip to Content
Equipment and Instrumentation Portal (EQUIP)

metrology and photolithography

Four Point Probe - Alessi CPS-7089-17

The Alessi CPS-7089-17 4-point Probe can be used to measure film thickness, but is usually used to measure the sheet resistance of shallow layers (as a result of epitaxy, ion-implant, diffusion or sputtering) and the bulk resistivity of bare wafers.

Location

Electrical Engineering Cleanroom
Davis Hall, Suite 114
University at Buffalo North Campus
Buffalo, NY 14260

Fees

Usage Fee: $25/hour (academic), $100/hour (industry)

For general inquiries, contact:

Donald J. Goralski

Director, Shared Instrumentation Laboratories

(716) 645-5151

 

For technical inquiries, contact:

David Eason, PhD

Technical Director, Shared Instrumentation Laboratories

(716) 645-8496