Chemicals provided by the Shared Instrumentation Laboratories
- 50 PMMA A-9 (positive polymer)
- 950 PMMA A-5 (positive polymer)
- 950 PMMA A-4 (positive polymer)
- 950 PMMA A-2 (positive polymer)
- 495 PMMA A-4 (positive polymer)
- Copolymer EL9 in anisole (EL9 MMA 8.5)
- A2 300 MF Developer
- Ammonium hydroxide (NH4OH)
- Hexamethyldisilazane, 98% ( N2 flushed)
- LOR -1A (Lift off Resist positive polymer)
- LOR -3B (Lift off Resist)
- LOR -10B (Lift off Resist)
- MF-26A (TMAH based developer)
- MIBK/IPA 1:3 Developer
- P-20 primer
- Remover PG
- S1805 (Microposit, positive photoresist)
- S1813 (Microposit, positive photoresist)
- S1818 (Microposit, positive photoresist)
- KL 1607 (positive photoresist)
- MF-319 (TMAH based developer for S1818)
- 1165 (Stripper for S1818 and PMMA)
- Kemlabs, HARE SQ-5 (negative resist)
- Kemlabs, HARE SQ-10 (negative resist)
- Kemlabs, HARE SQ-50 (negative resist)
- Kemlabs, HARE SQ Developer
- SU-8 2010 (negative resist)
- SU-8 2015 (negative resist)
- SU-8 2050 (negative resist)
- SU-8 2100 (negative resist)
- SU-8 Developer
- PMGI SF-10
- OmniCoat
- Tetrahydrofuran, T425-1
- Chloroform
- Tetraethoxysilane, 99.9% (TEOS)
- H2O2 (Hydrogen Peroxide)
- Acetone, electronic grade
- Methanol, electronic grade
- Ethanol (ethyl alcohol)
- Isopropyl alcohol, 99.5%, electronic grade
- Trichloroethylene, electronic grade 99.5+%
- Oxygen gas
- Argon gas
- Nitrogen gas
- Helium gas
- CDA (Clean dry air)
- RODI water
- BCl3 Gas (Boron Trichloride)
- Cl2 Gas (Chlorine)
- CF4 gas (Tetrafluoromethane)
- Forming gas 5%H2/95%Ar
- Acetone
- Methanol
- Isopropyl alcohol, 70%
- Chloroform
- Argon gas
- Nitrogen gas
- Helium gas
- CDA (Clean dry air)
- RODI water